Root Cause Analysis for Semiconductor Wafer Contamination
PiFM identifies sub-20 nm organic and inorganic wafer contaminants non-destructively, accelerating semiconductor root-cause analysis.
PiFM
Surface-Sensitive Characterisation of ALD Films on Drug Particles
Traditional surface analysis techniques can’t reveal the true story at the nanoscale—especially for ultrathin ALD coatings. They miss crucial details about film uniformity and coverage…
