J A Woollam In-Situ Spectroscopic Ellipsometers
In Situ Spectroscopic Ellipsometry (SE) measures a sample “in position” as conditions are varied. This includes measurements during film growth or removal; during variation in temperature, humidity, or other environmental conditions; and during other external stimulation of the sample (magnetic, electric).
In Situ SE is routinely used to monitor growth or etch of a thin film and can be implemented for real-time feedback control. It is also common to use in situ measurements to characterise optical constants during different process conditions.
The M-2000 line of spectroscopic ellipsometers is engineered to meet the diverse demands of thin film characterisation. An advanced optical design, wide spectral range, and fast data acquisition combine in an extremely powerful and versatile tool.
M-2000 delivers both speed and accuracy. J A Woollam’s patented RCE technology combines Rotating Compensator Ellipsometry with high-speed CCD detection to collect the entire spectrum (hundreds of wavelengths) in a fraction of a second with a wide array of configurations.
M-2000 is the first ellipsometer to truly excel at everything from in-situ monitoring and process control to large-area uniformity mapping and general purpose thin film characterisation. No other ellipsometer technology acquires a full spectrum faster.
Wide Spectral Range
Collect over 700 wavelengths from the ultraviolet to the near infrared – all simultaneously.
Flexible System Integration
With modular optical design, the M-2000 is suited for direct attachment to your process chamber or configured on any of Woollam’s table-top bases.
Advanced design ensures accurate ellipsometry measurements for any sample.
The RC2 design builds on 25 years of experience. It combines the best features of previous models with innovative new technology: dual rotating compensators, achromatic compensator design, advanced light source and next-generation spectrometer design. The RC2 is a near-universal solution for the diverse applications of spectroscopic ellipsometry.
Wide Spectral Range
Collect over 1000 wavelengths from the ultraviolet to the near infrared, all simultaneously.
Fast Measurement Speed
Synchronous operation of both compensators allows highly accurate data without waiting to “zone-average” over optical elements. Collect the entire spectrum (over 1000 wavelengths) simultaneously in a fraction of a second.
J A Woollam have developed a new ellipsometer developed specifically for in-situ monitoring of thickness and optical properties.
Determine thickness and optical constants with high certainty with Woollam’s proven spectroscopic ellipsometry including advanced data analysis capability, gives you thickness and optical properties with much higher certainty than other techniques.
New compact design enables easy integration onto any ALD chamber.
Measure any kind of material-dielectrics, metals, metal oxides and more.
The power of spectroscopic ellipsometry at a reasonable price.
User friendly interface for real time data analysis and easy chamber integration.
Fast, Wide-Spectrum Measurements
While others claim fast measurements, only J.A Woollam ellipsometers provide fast, spectroscopic data over a wide wavelength range. The iSE utilizes a new optical design with Dual-Rotation™ in combination with modern CCD detection to provide hundreds of wavelengths in a fraction of a second.
Complete EASE Software
The next generation of ellipsometry software has arrived with CompleteEASE®, revolutionary new software for Woollam ellipsometers. It’s easier than ever to use, and with the world-class quality you’ve come to expect from Woollam Company.
CompleteEASE® is an all-inclusive software package to handle all your ellipsometry requirements. Conveniently measure the uniformity of your samples with automated sample mapping. Collect in-situ data with spectroscopic ellipsometry on your process chamber or with add-on temperature control stage or liquid cell. All your data acquisition needs are combined into one easy-to-use software package.
Lab to Fab Operation
Suitable for both research and production environments. CompleteEASE is designed with advanced features for use in the research lab. Then transfer to the factory floor running automated recipes with user-programmable scan patterns, fast data acquisition, and automated analysis models.
Film thickness and optical properties are critical to performance of solar devices. Ellipsometry is used for development and monitoring of all PV materials: a-Si, μc-Si, poly-Si, AR Coatings (SiNx, AlNx), TCO Films (ITO, ZnOx, doped SnO2, AZO), CdS, CdTe, CIGS, organic PV materials, and dye sensitised films
Thickness measurements are not independent of the optical constants. The film thickness affects the path length of light travelling through the film, but the index determines the light waves’ velocity and refracted angle. Thus, both contribute to the delay between surface reflection and light traveling through the film. Both n and k must be known or determined along with the thickness to get the correct results from an optical measurement.
Accurate wavelength selection using monochromator allows measurements at the operating wavelength for optics, e.g. 1550nm, 1310nm, 980nm, 632.8nm, 589nm
The film thickness is determined by interference between light reflecting from the surface and light traveling through the film. Depending on the relative phase of the rejoining light to the surface reflection, interference can be defined as constructive or destructive. The interference involves both amplitude and phase information
The M-2000 can be used for a variety of chemical and biological applications, either as a stand-alone tool or in combination with one of our many accessories. Study materials under liquid ambient, at high or low temperatures, or in conjunction with QCM-D measurements
Great progress has occurred in the area of organic layers and stacks used for display (OLED) or photovoltaic applications. There are many different materials being studied, from small molecules such as Alq3 to conjugated polymers such as P3HT. Often multiple materials are blended together – which requires the wide spectral range of the M-2000 – to probe different wavelengths where the organics are optically different. Long-chain molecules may also have significant anisotropy, where orientational stacking of the polymer chains produces different optical constants in different directions
Traditional ellipsometry applications are still going strong. Characterise any semiconductor material: resists, photomasks, SiON, ONO stacks, low-k dielectrics, high-k gates, SOI, SiGe, II-VI and III-V ternary and quaternary compounds
Lithography thin films were an important motivation for the VUV-VASE® development. It has been successfully used to characterise all types of films in this area, including Photoresists and Bottom and Top AR Coatings
Graphene is a uniquely challenging ellipsometry problem because its electronic properties result in a material that is optically absorbing across the entire measureable spectrum while also being an ultra-thin film. This combination generally results in insufficient information to determine the optical properties of the film from a single measurement. However, this can be overcome by designing an experiment that will enhance information content such as the interference enhancement technique, a Multi-Sample Analysis approach or a combination of both.